Proceedings of the 2016 2nd Workshop on Advanced Research and Technology in Industry Applications

Analysis and Design of Charge Pump Configurations Based on Voltage Doubler for RFID

Authors
Mengxin Zhang, Jiancheng Li, Hongyi Wang, Cong Li, Li Yang
Corresponding Author
Mengxin Zhang
Available Online May 2016.
DOI
10.2991/wartia-16.2016.340How to use a DOI?
Keywords
Charge pump, Voltage doubler, RFID, Body effect.
Abstract

Charge pump is the configuration which can provide a voltage gain to program nonvolatile memory in radio frequency identification (RFID). In this paper, A complete theory of charge pump is presented, which shows that the influence of body effect on power dissipation and power efficiency is more and more obvious. To solve this problem, a voltage doubler applying new body biasing is proposed, which has been implemented under 0.18 CMOS process. The 10-stages proposed charge pump with pumping capacitor of 1pF at the clock of 2MHz can show a maximum power efficiency of 84%, in addition, it also can boost the voltage 1.8V input to 18.6V under 2 output current successfully.

Copyright
© 2016, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2016 2nd Workshop on Advanced Research and Technology in Industry Applications
Series
Advances in Engineering Research
Publication Date
May 2016
ISBN
978-94-6252-195-7
ISSN
2352-5401
DOI
10.2991/wartia-16.2016.340How to use a DOI?
Copyright
© 2016, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Mengxin Zhang
AU  - Jiancheng Li
AU  - Hongyi Wang
AU  - Cong Li
AU  - Li Yang
PY  - 2016/05
DA  - 2016/05
TI  - Analysis and Design of Charge Pump Configurations Based on Voltage Doubler for RFID
BT  - Proceedings of the 2016 2nd Workshop on Advanced Research and Technology in Industry Applications
PB  - Atlantis Press
SP  - 1714
EP  - 1719
SN  - 2352-5401
UR  - https://doi.org/10.2991/wartia-16.2016.340
DO  - 10.2991/wartia-16.2016.340
ID  - Zhang2016/05
ER  -