Cultural Industry System Innovation and Cultural Industry Development: Based on the Comparison of Beijing, Shanghai and Shenzhen

DOI

10.2991/assehr.k.200801.058How to use a DOI?

Keywords

Cultural industry, System innovation, Comparison, Scientific and Technological innovation

Abstract

The actively innovation of cultural industry system brings about the good status of cultural industry’s development. In Beijing, Shanghai and Shenzhen, a large number of cultural industry giants are clustering, which is due to the innovation of cultural industry system. As for the proportion of technological innovation policy, Shenzhen (0.80) has the advantage of technological innovation in sum, which is higher than Beijing (0.67) and Shanghai (0.56). The rangeability of government subsidy policy in Shanghai is greater than Beijing and Shenzhen. From the perspective of the proportion of supportive policies of cultural enterprises, Beijing (0.07) had made a lot of policies which more than Shanghai’s (0.05) and Shenzhen’s (0.03). Compared with the innovation competence of cultural industry system, Shanghai’s innovation competence index (18.02) is higher than Beijing’s (16.04) and Shenzhen’s (13.77). In view of this, achieving the intimately interaction between cultural industry system innovation and cultural industry development environment will be the key factor for the innovation of cultural industry system in the future.

Copyright

© 2020, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Shanglin Si
AU  - Xuefang Xie
AU  - Qinliang Liu
PY  - 2020
DA  - 2020/08/01
TI  - Cultural Industry System Innovation and Cultural Industry Development: Based on the Comparison of Beijing, Shanghai and Shenzhen
BT  - Proceedings of the 2020 International Conference on Social Science, Economics and Education Research (SSEER 2020)
PB  - Atlantis Press
SP  - 240
EP  - 243
SN  - 2352-5398
UR  - https://doi.org/10.2991/assehr.k.200801.058
DO  - 10.2991/assehr.k.200801.058
ID  - Si2020
ER  -