Comparative Study on Structural and Electrical Properties of Network and Continuous Ni80Fe20 Films

DOI

10.2991/icmse-16.2016.83How to use a DOI?

Keywords

Ni80Fe20 film, Network structure, Electrical property.

Abstract

200 nm-thick Ni80Fe20 films were deposited on anodic aluminium oxide (AAO) and SiO2/Si(100) substrates at 300 K by a magnetron sputtering system with the oblique target. The film grown on the AAO substrate has a network structure while that deposited on the SiO2/Si(100) substrate is continuous. The network film is formed by columnar granule connection. The columnar granule consists of many fine granular grains. The continuous film grows with thin columnar grains. The columnar grain size of the continuous film is almost equal to the granular grain size of the network film. A temperature dependence of the resistance within 3-300 K reveals that the network film exhibits a minimal resistance at about 35 K. A logarithmic temperature dependence of conductance is verified at temperatures below 35 K. The temperature coefficient of resistance of the network film is smaller than that of the continuous film in 150-300 K.

Copyright

© 2016, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Jun-Sheng Ma
AU  - Ming-Peng Yu
AU  - Kang He
AU  - Hong Qiu
PY  - 2016/12
DA  - 2016/12
TI  - Comparative Study on Structural and Electrical Properties of Network and Continuous Ni80Fe20 Films
BT  - Proceedings of the 4th 2016 International Conference on Material Science and Engineering (ICMSE 2016)
PB  - Atlantis Press
SP  - 497
EP  - 502
SN  - 2352-5401
UR  - https://doi.org/10.2991/icmse-16.2016.83
DO  - 10.2991/icmse-16.2016.83
ID  - Ma2016/12
ER  -