Analysis on the Optical Characteristics of ZnO Thin Film Prepared by Magnetron Sputtering

DOI

10.2991/icmmcce-15.2015.446How to use a DOI?

Keywords

magnetron sputtering , ZnO thin films, optical property, morphology

Abstract

This paper used magnetron sputtering to grow ZnO film on Al2O3 substrate. All the samples were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), ultra-violet spectrometer (UVS) and photoluminescence (PL). Results showed that: the doped ZnO thin films were still had the hexagonal wurtzite structure; the magnetron sputtering coated samples’ transmission edge would have blue shift and then red shift along with the increase of the annealing temperature; all samples had decent luminescent property; 0 C sputtering coated samples had decent surface flatness and even distribution of particles.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Jing-hua Xu
PY  - 2015/12
DA  - 2015/12
TI  - Analysis on the Optical Characteristics of ZnO Thin Film Prepared by Magnetron Sputtering
BT  - Proceedings of the 4th International Conference on Mechatronics, Materials, Chemistry and Computer Engineering 2015
PB  - Atlantis Press
SP  - 1143
EP  - 1147
SN  - 2352-538X
UR  - https://doi.org/10.2991/icmmcce-15.2015.446
DO  - 10.2991/icmmcce-15.2015.446
ID  - Xu2015/12
ER  -