Proceedings of the 2015 International Conference on Advanced Engineering Materials and Technology

Fabrication of the pyramidal microstructure on silicon substrate using KOH solution

Authors
Yaqin Wang, Ruizhi Luo, Junjun Ma, Shi-Qing Man
Corresponding Author
Yaqin Wang
Available Online August 2015.
DOI
https://doi.org/10.2991/icaemt-15.2015.60How to use a DOI?
Keywords
pyramid, KOH, microstructure, fabrication.
Abstract

he texturization of monocrystalline silicon wafers using a mixture of potassium hydroxide and isopropyl alcohol solutions has been investigated. The texture morphology and pyramid size are affected by the KOH concentration, the temperature and the time together. The surface reflectance and the surface morphology were measured with a UV-Visible Spectrophotometer and a scanning electronic microscope (SEM) respectively. We reported a relatively uniform size, dense arrangement pyramid microstructure on the basement of silicon texture. According to the reflectance and SEM patterns, we got the appropriate concentration of KOH, 20wt% and 25wt%, with the corresponding reflectance were 12.049% and 14.593%. It means that either too low temperature with a long time or too high temperature with a short can damage the formation. We got the surface morphology, which was consisted of 1-1.5 µm sized pyramids. From the pyramid dimension, the optimum process condition was found to be 20wt% KOH, 3wt% IPA, 60 and 5 min at which was reduced to 1.292µm. From the SEM images density and uniformity, the optimized condition is 20wt% KOH, 3wt% IPA, 70 and 15mins though its size has reached the 1.404µm.

Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2015 International Conference on Advanced Engineering Materials and Technology
Series
Advances in Engineering Research
Publication Date
August 2015
ISBN
978-94-6252-108-7
ISSN
2352-5401
DOI
https://doi.org/10.2991/icaemt-15.2015.60How to use a DOI?
Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Yaqin Wang
AU  - Ruizhi Luo
AU  - Junjun Ma
AU  - Shi-Qing Man
PY  - 2015/08
DA  - 2015/08
TI  - Fabrication of the pyramidal microstructure on silicon substrate using KOH solution
BT  - Proceedings of the 2015 International Conference on Advanced Engineering Materials and Technology
PB  - Atlantis Press
SP  - 302
EP  - 307
SN  - 2352-5401
UR  - https://doi.org/10.2991/icaemt-15.2015.60
DO  - https://doi.org/10.2991/icaemt-15.2015.60
ID  - Wang2015/08
ER  -