Proceedings of the 2nd International Conference on Electronic & Mechanical Engineering and Information Technology (EMEIT 2012)

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Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering

Authors
Tao Chen, Maojin Dong, Jizhou Wang, Ling Zhang, Chen Li
Corresponding Author
Tao Chen
Available Online September 2012.
DOI
10.2991/emeit.2012.272How to use a DOI?
Keywords
Silicon oxycarbide, thin films, RF magnetron sputtering, optical performance, indentation hardness.
Abstract

Silicon oxycarbide(SiCO)thin films are a kind of glassy compound materials, which possess many potential excellent properties such as thermal stability, big energy band, big refractive index and high hardness, and have many potential applications in space. The preparation processes of SiCO thin films synthesized by RF magnetron sputtering with different substrate temperature, working pressure or sputtering power were studied. And varied surface analysis methods were used to characterize the optical and mechanical properties of SiCO thin films. The dependence of the properties to the process parameters was else studied. The results of the properties SiCO thin films deposited on K9 glass indicated that lower substrate temperature and sputtering power, higher working pressure could get SiCO thin films with better transmittance. The indentation hardness HIT of SiCO thin films on K9 glass had dependence on substrate temperature and sputtering power, and the rise of substrate temperature could enhance the indentation hardness HIT evidently. The indentation hardness of sample K2 and M2 which synthesized when substrate temperature was 473K was as high as 18.15, 13.20GPa respectively.

Copyright
© 2012, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2nd International Conference on Electronic & Mechanical Engineering and Information Technology (EMEIT 2012)
Series
Advances in Intelligent Systems Research
Publication Date
September 2012
ISBN
978-90-78677-60-4
ISSN
1951-6851
DOI
10.2991/emeit.2012.272How to use a DOI?
Copyright
© 2012, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

risenwbib
TY  - CONF
AU  - Tao Chen
AU  - Maojin Dong
AU  - Jizhou Wang
AU  - Ling Zhang
AU  - Chen Li
PY  - 2012/09
DA  - 2012/09
TI  - Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering
BT  - Proceedings of the 2nd International Conference on Electronic & Mechanical Engineering and Information Technology (EMEIT 2012)
PB  - Atlantis Press
SP  - 1233
EP  - 1237
SN  - 1951-6851
UR  - https://doi.org/10.2991/emeit.2012.272
DO  - 10.2991/emeit.2012.272
ID  - Chen2012/09
ER  -