Study of Emissivity of MOCVD Iridium Film with Different Topography
Authors
Shirui Yang, Xiaodong Yu, Chengwen Tan, Yandong Wang, Honglei Ma, Kexue Liu, Hongnian Cai
Corresponding Author
Shirui Yang
Available Online July 2015.
- DOI
- 10.2991/cmfe-15.2015.49How to use a DOI?
- Keywords
- iridium, film, emissivity, Ir(acac)3
- Abstract
The emissivity of different topographies of iridium films which were obtained using Ir(acac)3 (1.216×103 Pa) and hydrogen (5.575×104 Pa) in a cold-wall reactor at atmospheric pressure was studied. The bigger size the grains are, the uneven topography is obtained, the higher the emissivity is. The bigger grain size is related to higher deposition temperature and turbulent flow in rapid deposition. The X-ray diffraction peaks indicate the only existence of metal iridium with highly crystalline structures. All the films show a (111) preferred orientation, which enhances with decreasing size grains and emissivity.
- Copyright
- © 2015, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Shirui Yang AU - Xiaodong Yu AU - Chengwen Tan AU - Yandong Wang AU - Honglei Ma AU - Kexue Liu AU - Hongnian Cai PY - 2015/07 DA - 2015/07 TI - Study of Emissivity of MOCVD Iridium Film with Different Topography BT - Proceedings of the International Conference on Chemical, Material and Food Engineering PB - Atlantis Press SP - 208 EP - 211 SN - 2352-5401 UR - https://doi.org/10.2991/cmfe-15.2015.49 DO - 10.2991/cmfe-15.2015.49 ID - Yang2015/07 ER -