Bi2Te3 Thin Films Grown by Magnetron Sputtering
- 10.2991/meita-15.2015.93How to use a DOI?
- Thermoelectric effects, thin films, x-ray diffraction (XRD), magnetron sputtering
Bi2Te3 thin films grown the substrate with 80 nm in diameter have been prepared by using magnetron sputtering technique. The structure of thin films was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using SEM measurements. The results indicate that Bi2Te3 alloys could be potentially important TE materials for many applications, especially for prolonged TE device operation at high temperatures, such as for recovery of waste heat from automobile, aircrafts, and power plants due to their superiorphysical properties, including the ability of operating at high temperature/high power conditions, high mechanical strength and stability, and radiation hardness.
- © 2015, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - X. L. Guo AU - J. J. Geng AU - Y. H. Zhu AU - H. Jiang AU - Z. L. Wang PY - 2015/08 DA - 2015/08 TI - Bi2Te3 Thin Films Grown by Magnetron Sputtering BT - Proceedings of the 2015 International Conference on Materials Engineering and Information Technology Applications PB - Atlantis Press SP - 515 EP - 518 SN - 2352-5401 UR - https://doi.org/10.2991/meita-15.2015.93 DO - 10.2991/meita-15.2015.93 ID - Guo2015/08 ER -