Proceedings of the 2015 3rd International Conference on Machinery, Materials and Information Technology Applications

The structure and electrochemical properties of BDD deposited on the Ti-substrate with Ta buffer layer

Authors
Feng Liu, Zhengran Huang, Dawei Pan, Guosheng Huang, Yonggui Yan, Xiangbo Li
Corresponding Author
Feng Liu
Available Online November 2015.
DOI
10.2991/icmmita-15.2015.327How to use a DOI?
Keywords
MWCVD; BDD electrode; electrochemical oxidation.
Abstract

In this paper, boron doped diamond (BDD) thin flms have been deposited on Ti-based substrates with or without a Ta intermediate layer by microwave plasma chemical vapour deposition (MWCVD). Raman spectroscopy and scanning electron microscopy (SEM) examinations demonstrate that the electrode has well-defined diamond features. XRD spectroscopy shows no TiC in the BDD film on the Ti substrate with Ta buffer layer. It is observed that both the BDD electrodes have similar overpotential 2.5V for water electrolysis prohibiting the evolution of oxygen in the cyclic voltammetry test. Further more?the removal efficiency of chemical oxygen demand (COD) approaches to 100% in the electrochemical oxidation of wastewater containing phenol.

Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2015 3rd International Conference on Machinery, Materials and Information Technology Applications
Series
Advances in Computer Science Research
Publication Date
November 2015
ISBN
978-94-6252-120-9
ISSN
2352-538X
DOI
10.2991/icmmita-15.2015.327How to use a DOI?
Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Feng Liu
AU  - Zhengran Huang
AU  - Dawei Pan
AU  - Guosheng Huang
AU  - Yonggui Yan
AU  - Xiangbo Li
PY  - 2015/11
DA  - 2015/11
TI  - The structure and electrochemical properties of BDD deposited on the Ti-substrate with Ta buffer layer
BT  - Proceedings of the 2015 3rd International Conference on Machinery, Materials and Information Technology Applications
PB  - Atlantis Press
SP  - 1758
EP  - 1761
SN  - 2352-538X
UR  - https://doi.org/10.2991/icmmita-15.2015.327
DO  - 10.2991/icmmita-15.2015.327
ID  - Liu2015/11
ER  -