Optimum Structure of multi-layer silver superlenses for optical lithography

DOI

10.2991/iccsee.2013.330How to use a DOI?

Keywords

Superlens, Surface plasmons, Photolithography, Imaging performance

Abstract

Multilayer silver superlenses had been shown to having sub-wavelength performance. In this paper, we investigate the effects on imaging performance of different multilayer imaging structures comprising alternately layered metal and dielectric films. We first compare and analyze transmission coefficients of different structures by changing the layer thickness ratio, the total thickness of the layers and the dielectric materials. Then we simulate the imaging performance by the finite difference time domain (FDTD) method of these multilayered superlenses. According to the analyzing and simulated results, a multilayer silver superlens with optimum structure is suggested.

Copyright

© 2013, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Junxian Ma
AU  - Kuangying Yuan
PY  - 2013/03
DA  - 2013/03
TI  - Optimum Structure of multi-layer silver superlenses for optical lithography
BT  - Proceedings of the 2nd International Conference on Computer Science and Electronics Engineering (ICCSEE 2013)
PB  - Atlantis Press
SP  - 1318
EP  - 1321
SN  - 1951-6851
UR  - https://doi.org/10.2991/iccsee.2013.330
DO  - 10.2991/iccsee.2013.330
ID  - Ma2013/03
ER  -