Proceedings of the 2017 International Conference on Art Studies: Science, Experience, Education (ICASSEE 2017)

Discussion on the Cultivation Pattern of Applied Costume Designers

Authors
Zhihui Wang
Corresponding Author
Zhihui Wang
Available Online December 2017.
DOI
10.2991/icassee-17.2018.90How to use a DOI?
Keywords
applied; costume design; cultivation patter; educational pattern
Abstract

Nowadays, most of researches on costume designer cultivation patterns reform in high educational institutes are conducted in priority universities, yet there are few researches on applied costume designer cultivation patterns reform. In China, undergraduate educational institutes are in an absolute majority among professional colleges and universities, however, due to a series of causes such as short term establishment or irrational teaching structure and more, many problems arise out of the school running, whose functions should be but not completely exerted, and most of graduates majoring in costume design will need a long term transition period before being adapted to enterprise requirements after graduation, who are still far falling behind what costume enterprise want. Generally most graduates majoring in costume design are capable of freehand sketching, good at representing costume artistic effect, yet poor in hand operation and comprehensive skills, they have few knowledge about costume enterprises to take jobs in costume enterprises. This article tries to solve the problems through analysis, raising researches on applied costume design cultivation patterns reform, which is expected to promote and attract more researches on the basis of investigation and researches of the topic in order to improve the costume education, create a costume design educational pattern meeting the current social background, follow the social development demand so as to make a bit of contributions to the costume design education and costume enterprise development and to the fashionable industry in the country.

Copyright
© 2018, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2017 International Conference on Art Studies: Science, Experience, Education (ICASSEE 2017)
Series
Advances in Social Science, Education and Humanities Research
Publication Date
December 2017
ISBN
10.2991/icassee-17.2018.90
ISSN
2352-5398
DOI
10.2991/icassee-17.2018.90How to use a DOI?
Copyright
© 2018, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Zhihui Wang
PY  - 2017/12
DA  - 2017/12
TI  - Discussion on the Cultivation Pattern of Applied Costume Designers
BT  - Proceedings of the 2017 International Conference on Art Studies: Science, Experience, Education (ICASSEE 2017)
PB  - Atlantis Press
SP  - 393
EP  - 395
SN  - 2352-5398
UR  - https://doi.org/10.2991/icassee-17.2018.90
DO  - 10.2991/icassee-17.2018.90
ID  - Wang2017/12
ER  -