Development History and Current Situation of Resistor Array Technology at Home and Abroad

DOI

10.2991/ahis.k.220601.011How to use a DOI?

Keywords

Resistor Array; Infrared Scene Projector; Hardware in the Loop Simulation

Abstract

The development experience and current situation of resistance array technology at home and abroad are briefly reviewed. Foreign resistance array technology started early and completed the development from small-scale to large-scale, from scanning to snapshot. At present, it is developing towards specialization such as ultra-high temperature resistance array. Domestic resistance array technology has experienced three generations of technology. The first generation is manufactured by PMOS process, with poor performance; The second generation is manufactured by CMOS process, which solves most of the performance problems, but the duty cycle and scale are restricted by processing technology, so it is difficult to improve; The third generation uses membrane transfer technology to solve the conflict of two-dimensional machining technology between the duty cycle and circuit complexity, but the technology and process maturity still need to be improved.

Copyright

© 2022 The Authors. Published by Atlantis Press International B.V.

Open Access

This is an open access article distributed under the CC BY-NC 4.0 license.

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TY  - CONF
AU  - Yichong Xu
AU  - Jian Chen
AU  - Shouyi Liao
PY  - 2022
DA  - 2022/06/02
TI  - Development History and Current Situation of Resistor Array Technology at Home and Abroad
BT  - Proceedings of the 2021 International conference on Smart Technologies and Systems for Internet of Things (STS-IOT 2021)
PB  - Atlantis Press
SP  - 50
EP  - 54
SN  - 2589-4919
UR  - https://doi.org/10.2991/ahis.k.220601.011
DO  - 10.2991/ahis.k.220601.011
ID  - Xu2022
ER  -