The latest development of Micro-nano manufacturing of next generation lithography technology

DOI

10.2991/icimm-15.2015.273How to use a DOI?

Keywords

Nano-fabrication; Technology node; EUV; NIL; DSA.

Abstract

This paper combined with the latest lithography technology development in recent years, and introduced the current mainstream technology of 32 nm technology node. Then focus on introducing the concept, technical characteristics, development situation and facing the challenge of next generation lithography technology candidates that extreme ultraviolet carved (EUV), electron beam direct writing lithography, nano-imprinting lithography (NIL) and directional self-assembly (DSA) technologies.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Zhongming Zhang
AU  - Hongxue Wang
PY  - 2015/07
DA  - 2015/07
TI  - The latest development of Micro-nano manufacturing of next generation lithography technology
BT  - Proceedings of the 5th International Conference on Information Engineering for Mechanics and Materials
PB  - Atlantis Press
SP  - 1499
EP  - 1502
SN  - 2352-5401
UR  - https://doi.org/10.2991/icimm-15.2015.273
DO  - 10.2991/icimm-15.2015.273
ID  - Zhang2015/07
ER  -