Synthesis of copper oxide by reactive magnetron sputtering for photoelectrochemical water splitting

DOI

10.2991/iceep-18.2018.185How to use a DOI?

Keywords

copper oxide, reactive magnetron sputtering, photoelectrochemical water splitting.

Abstract

Copper oxide contains of bivalent copper and monovalent copper, which is widely distributed in earth resources. In this article, the copper oxide films were deposited on transparent conducting glasses (FTO) by magnetron reactive sputtering under different sputtering conditions of power and oxygen flow. The use of reactive magnetron sputtering can deposit a uniform copper oxide film with large scale rapidly. An analysis in detail on composition, morphology, optical and electrochemical properties of the sputtered copper oxide film was carried out. It is found that, the copper oxide with sputtering power of 30 W and O2 flow of 7 sccm provide a photoinduced current of -3.0 mA cm-2 under a bias potential of -0.5 V (vs. Ag/AgCl), which was found to be near 1.5 times higher than that with O2 flow of 5 sccm (30 W), and 3 times higher than O2 flow of 7 sccm (60 W), respectively.

Copyright

© 2018, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Tian Xie
AU  - Tao Zheng
AU  - Jin-Ping Ao
PY  - 2018/09
DA  - 2018/09
TI  - Synthesis of copper oxide by reactive magnetron sputtering for photoelectrochemical water splitting
BT  - Proceedings of the 2018 7th International Conference on Energy and Environmental Protection (ICEEP 2018)
PB  - Atlantis Press
SP  - 1055
EP  - 1061
SN  - 2352-5401
UR  - https://doi.org/10.2991/iceep-18.2018.185
DO  - 10.2991/iceep-18.2018.185
ID  - Xie2018/09
ER  -