Research on microwave mode and coupling energy in plasma reactor design for MPCVD diamond
- https://doi.org/10.2991/ic3me-15.2015.416How to use a DOI?
- Microwave plasma chemical vapor deposition (MPCVD), Plasma reactor, Coupling efficiency, Electric field distribution
Systematic research on the performance of former designed plasma reactor was carried out in this paper. Numerical simulation method was performed, the distribution of electromagnetic field in microwave cavity by Finite Element Method (FEM). Microwave mode in waveguide, coaxial transformation part and plasma reactor were studied, they are TE10, TEM and TM021 respectively. The impact factor of microwave coupling efficiency was studied. The research results show that, the shape of interconnection between the inner conductor of the antenna and the substrate holder has influence on microwave coupling efficiency. The coupling energy is different when the radius of coaxial conductor was changed, but with the same microwave resonate mode inside the cavity. The research results will provide theory basis for the improvement of device for diamond film deposition, it is also very meaningful for the development of MPCVD technique.
- © 2015, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Xiaojing Li AU - Shunqi Zheng AU - Hongwei Liu AU - Chunyu Gao AU - Xiumei Shi AU - Qingxiao Li AU - Yang Ni AU - Yong He PY - 2015/08 DA - 2015/08 TI - Research on microwave mode and coupling energy in plasma reactor design for MPCVD diamond BT - Proceedings of the 3rd International Conference on Material, Mechanical and Manufacturing Engineering PB - Atlantis Press SP - 2170 EP - 2176 SN - 2352-5401 UR - https://doi.org/10.2991/ic3me-15.2015.416 DO - https://doi.org/10.2991/ic3me-15.2015.416 ID - Li2015/08 ER -