Study of gas supply way and velocity chosen during the process of MPCVD diamond

DOI

10.2991/asei-15.2015.132How to use a DOI?

Keywords

Microwave plasma chemical vapor deposition (MPCVD), Gas supply, Velocity

Abstract

The Microwave plasma chemical vapor deposition (MPCVD) method was used to make diamond film in this paper. The influence of working gas supply mode and velocity were investigated using numerical simulation method. The distribution of gas flow rate at two different gas supply modes was analyzed by software Fluent. The results showed that, the gas supply mode whose gas inlet is a hole located at the bottom of the plunger is a better choice for the formation of uniform film, gas velocity is chosen between 5m/s to 10m/s

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - XiaoJing Li
AU  - ShunQi Zheng
AU  - Yangsheng Zheng
AU  - Wenqing Wang
AU  - Renna Wu
AU  - Rui Li
PY  - 2015/05
DA  - 2015/05
TI  - Study of gas supply way and velocity chosen during the process of MPCVD diamond
BT  - Proceedings of the 2015 International conference on Applied Science and Engineering Innovation
PB  - Atlantis Press
SP  - 697
EP  - 701
SN  - 2352-5401
UR  - https://doi.org/10.2991/asei-15.2015.132
DO  - 10.2991/asei-15.2015.132
ID  - Li2015/05
ER  -